| 1. | In early ic fabrication practice, etch bias was usually dealt with by introducing an appropriate amount of compensation in the masking layer .
在早期的集成电路制作实践中，刻蚀偏差通常是通过在掩膜层上引入一个适量的修正来处理的。 |
| 2. | It ' s a more difficult task to integrate these new materials into the ic fabrication
将这些新材料综合运用于集成电路的制作是一项非常艰难的任务。 |
| 3. | This paper ' s aim is to combine computer technology for information management with ic fabrication and to study the design method of computer - aided management system of ic fabrication
本文的目的是将计算机信息管理技术与ic制造工程相结合，探讨用于ic制造的计算机辅助管理系统的设计开发方法。 |
| 4. | The computer management capability of ic fabrication is also poor . so it is significant for us to study the pattern and method of ic fabrication management and to develop the management system
因此，对ic制造管理模式和管理方法的研究以及管理系统的开发对我国集成电路产业的发展具有十分重要的意义。 |
| 5. | The paper mainly found on the application of photoresist in the process of ic fabrication to summarize the facets of reaction mechanism , performance index parameters and finally to indicate some new development directions in terms with process evolution target
主要围绕光刻胶在积体电路制造中的应用，对其反应机理及应用性能指标进行阐述，重点从工艺的角度去提出新的研究方向。 |
| 6. | A concept of ic technology database is presented after ic process is analyzed in detail . the ic fabrication computer - aided management system - icf _ cams is developed according to the model of simplified ic process . the result of icf _ cams running shows that it has the expectant management capability of ic process and that the concept of ic technology database is correct and feasible
本文首先对ic及其制造工艺以及管理信息系统作了概述，对ic工艺流程特点进行了深入剖析，提出了工艺库管理模式的概念，并选用了几个关键的单项工艺组成了一个简化的工艺流程模型，以此模型为原型系统设计开发了一个ic制造计算机辅助管理系统。 |
